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В МГТУ заработал самый точный российский квантовый процессор
Точность квантовых логических операций, реализованных на процессоре Snowdrop 4Q, превысили 99,1%
Plasma-chemical etching in chlorine-containing gases
Equipped with inductively coupled plasma source, the plant creates a high plasma density and, as a result, a high flux density of active radicals and ions.
The installation provides the following etching processes (uniformity across the plate for all processes <± 5%):