FMN Lab integrated photonics technologies at OPAL 2021
FMN Laboratory team took part in the Fourth International Conference on Optics, Photonics and Lasers (OPAL 2021). Evgeny Sergeev and Kirill Buzaverov representing FMN Lab nanophotonics team shared their advances as part of the poster session.
The posters were devoted to the technologies of creating photonic integrated circuits (PIC) with ultra low losses.
Kirill Buzaverov focused on the possibility of reducing losses by eliminating the roughness of the sidewalls of the waveguides. One of the ways to reduce roughness is to optimize the parameters of the reactive ion etching process. Evgeny Sergeev devoted his report to the nuances of electron lithography, namely, the selection of the appropriate conducting polymer and e-beam exposure parameters (electron beam spot size, exposure step and algorithm, use of a multi-pass mode, etc.).
FMN Laboratory has been developing the technology of fabricating photonic integrated circuits with losses of about 0,5 dB/cm at a wavelength of 925 nm. This level of loss fits the world indicators.
Similar to the previous OPAL conferences, the 4th International Conference on Optics, Photonics and Lasers (OPAL' 2021) incorporated three symposiums covering a broad range in optics, photonics and lasers, and provided an excellent opportunity to exchange ideas and present the latest advancements in these areas. The OPAL 2021 was organized by the IFSA, a professional, non-profit association serving for industry and academy for more than 20 years.
The purpose of OPAL’ 2021 brings together leading international researchers, engineers and practitioners interested in any of the optic-related technologies. The conference will offer plenary and invited talks, contributed oral and poster presentations, special sessions, tutorials, and exhibitions of commercial products. Social and cultural events will also take place to foster networking among the participants in a friendly manner.
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